Pattern drawing device and manufacturing method of pattern...

Details Pattern drawing device and manufacturing method of pattern... Pattern drawing device and manufacturing method of pattern...

2005-03-29

2005-03-29

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S030000, C347S249000, C347S258000, C716S030000, C716S030000

Reexamination Certificate

active

06872498

ABSTRACT:
The present invention provides a pattern drawing device that enables drawing with reduced operational processing loading of the associated CPU. Thus, in a pattern drawing device for forming a plurality of tracks disposed concentrically on a substrate to produce a two-dimensional pattern, a basic pixel sequence is prepared and used repeatedly in forward (positive) and/or reverse (negative) order to produce symmetric portions of the two-dimensional pattern.

REFERENCES:
patent: 59-171119 (1984-09-01), None
patent: 10-011814 (1998-01-01), None

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