Mask, exposure method, line width measuring method, and...

Details Mask, exposure method, line width measuring method, and... Mask, exposure method, line width measuring method, and...

2005-02-15

2005-02-15

Nelms, David (Department: 2818)

Active solid-state devices (e.g., transistors, solid-state diode

Responsive to non-electrical signal

Electromagnetic or particle radiation

C250S39600R, C355S040000

Reexamination Certificate

active

06855997

ABSTRACT:
A mask of the present invention has a circuit pattern to be transferred to a substrate via an optical system, and an inspection pattern to be used for a measurement of a line width of the pattern transferred to the substrate. By using such a mask, the time for proceeding from inspection to actual device exposure can be shortened.

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patent: 6094256 (2000-07-01), Grodnensky et al.
patent: 6296977 (2001-10-01), Kaise et al.
patent: A 5-217872 (1993-08-01), None
patent: A 9-312251 (1997-12-01), None

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