Bottom anti-reflective coat forming composition for lithography

Details Bottom anti-reflective coat forming composition for lithography Bottom anti-reflective coat forming composition for lithography

2005-08-09

2005-08-09

Pezzuto, Helen L. (Department: 1713)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S328500, C430S270100, C430S271100, C430S325000

Reexamination Certificate

active

06927266

ABSTRACT:
The present invention relates to a bottom anti-reflective coat forming composition having the resin with the structural unit comprising maleimide or maleimide derivative for the lithography process in the preparation of semiconductor device. The resin comprises maleimide or derivative thereof in the principal chain or the side chain and its weight-average molecular weight is 700-1000000. The invention offers the bottom anti-reflective coating for lithography showing high anti-reflective effect, no intermixing with resist layer, excellent resist pattern, and large dry etching rate in comparison to resist.

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Lynch et al., “Properties and Performance of Near UV Reflectivity Control Layers”, SPIE, vol. 2195, pp. 225-235, 1994.
Taylor et al., “Methacrylate Resists and Antireflective Coatings for 193 nm Lithography”, SPIE, vol. 3678, pp. 174-185, 1999.

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