Line profile asymmetry measurement using scatterometry

Details Line profile asymmetry measurement using scatterometry Line profile asymmetry measurement using scatterometry

2005-02-15

2005-02-15

Rosenberger, Richard A. (Department: 2877)

Optics: measuring and testing

Shape or surface configuration

C356S636000, C356S237500

Reexamination Certificate

active

06856408

ABSTRACT:
A method of and apparatus for measuring line profile asymmetries in microelectronic devices comprising directing light at an array of microelectronic features of a microelectronic device, detecting light scattered back from the array comprising either or both of one or more angles of reflection and one or more wavelengths, and comparing one or more characteristics of the back-scattered light by examining data from complementary angles of reflection or performing a model comparison.

REFERENCES:
patent: 4933567 (1990-06-01), Silva et al.
patent: 4978862 (1990-12-01), Silva et al.
patent: 5114233 (1992-05-01), Clark et al.
patent: 5144150 (1992-09-01), Yoshizumi et al.
patent: 5241369 (1993-08-01), McNeil et al.
patent: 5313542 (1994-05-01), Castonguay
patent: 5475617 (1995-12-01), Castonguay
patent: 5637873 (1997-06-01), Davis et al.
patent: 5640246 (1997-06-01), Castonguay
patent: 5682466 (1997-10-01), Maeda et al.
patent: 5703692 (1997-12-01), McNeil et al.
patent: 5739909 (1998-04-01), Blayo et al.
patent: 5864394 (1999-01-01), Jordan, III et al.
patent: 5867276 (1999-02-01), McNeil et al.
patent: 5889593 (1999-03-01), Bareket
patent: 5905573 (1999-05-01), Stallard et al.
patent: 5912741 (1999-06-01), Carter et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 5982489 (1999-11-01), Shiraishi
patent: 6075594 (2000-06-01), Thomas et al.
patent: 6212010 (2001-04-01), Iizuka et al.
patent: 6292259 (2001-09-01), Fossey et al.
patent: 6292265 (2001-09-01), Finarov et al.
patent: 6538731 (2003-03-01), Niu et al.
patent: 20020038196 (2002-03-01), Johnson et al.
patent: 20020135781 (2002-09-01), Singh et al.
patent: 20020135875 (2002-09-01), Niu et al.
patent: 20020158193 (2002-10-01), Sezginer et al.
patent: 20020182760 (2002-12-01), Wack et al.
patent: 20030002043 (2003-01-01), Abdulhalim et al.
patent: 20030042579 (2003-03-01), Schultz
patent: 20030043372 (2003-03-01), Schultz
patent: 20030044702 (2003-03-01), Schulz
patent: 20030143761 (2003-07-01), Fukuda
patent: 03-255907 (1991-11-01), None
patent: 06-317412 (1994-11-01), None
patent: 2001-074636 (2001-03-01), None
patent: WO 02065545 (2002-08-01), None
patent: WO 02069390 (2002-09-01), None
U.S. Provisional application No. 60/268,485, filed Feb. 12, 2001, Sezginer et al.
U.S. Provisional application No. 60/295,111, filed Jun. 1, 2001, Sezginer et al.
U.S. Provisional application No. 60/322,219, filed Sep. 14, 2001, Sezginer et al.

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