Ion source

Details Ion source Ion source

2005-02-01

2005-02-01

Wells, Nikita (Department: 2881)

Radiant energy

Ion generation

Field ionization type

C250S427000, C315S111810, C315S111910, C313S362100

Reexamination Certificate

active

06849854

ABSTRACT:
An ion source10for producing a beam of ions from a plasma is disclosed. A plasma is created at the center of an anode12by collisions between energetic electrons and molecules of an ionizable gas. The electrons are sourced from a cathode filament11and are accelerated to the anode12by an applied electric potential. A projection of the anode and a magnetic field having an axis aligned with the axis of the anode act together to concentrate the flow of electrons to the center of the anode12. The ionizable gas is introduced into an ionization region13of the ion source10at the point of concentrated electron flow. Ions created in the ionization region are expelled from the ion source as an ion beam centred on the axis of the magnetic field. The surfaces of the anode are coated with an electrically conductive non-oxidising layer of Titanium Nitride to prevent a build up of an insulating layer on the anode.

REFERENCES:
patent: 4862032 (1989-08-01), Kaufman et al.
patent: 6608431 (2003-08-01), Kaufman
patent: 6645301 (2003-11-01), Sainty
patent: 6750600 (2004-06-01), Kaufman et al.

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