Photosensitive composition for photoresist manufacture

Details Photosensitive composition for photoresist manufacture Photosensitive composition for photoresist manufacture

2005-10-11

2005-10-11

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S157000, C430S270100, C430S905000, C525S212000, C525S291000

Reexamination Certificate

active

06953649

ABSTRACT:
The invention concerns a novel photosensitive composition for photoresist and a system comprising a substrate and a photoresist obtained from said novel composition. The photosensitive composition for photoresist comprises a copolymer with hydrophobic blocks whereof at least one block is an hydrophobic block capable of generating a hydrophilic block and comprising at its end a group selected among dithioesters, thioesters-thiones, dithiocarbamates and xanthates, and a photoactive compound capable of generating under the effect of a radiation an active species reacting with the hydrophobic block to generate the hydrophilic block.

REFERENCES:
patent: 4689289 (1987-08-01), Crivello
patent: 5071731 (1991-12-01), Chen et al.
patent: 5368976 (1994-11-01), Tajima et al.
patent: 5556734 (1996-09-01), Yamachika et al.
patent: 5625020 (1997-04-01), Breyta et al.
patent: 5698361 (1997-12-01), Aoshima
patent: 6063542 (2000-05-01), Hyeon et al.
patent: 6379874 (2002-04-01), Ober et al.
patent: 6692884 (2004-02-01), Fujimori et al.
patent: WO 98 58974 (1998-12-01), None
Turner S R, Blevins R W: American Chemical Society, Div. Pol. Chem., vol. 29, no. 2, Sep. 1988, pp. 6-7, XP00986419 whole document.
Okawara M et al: Bulletin of the Tokyo Institute of Technology, JP. Tokyo, no. 78, 1966, pp. 1-16, XP002049822, ISSN.0366-3736—Abstract.
International Search Report.

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