Mask for use in lithography, method of making a mask,...

Details Mask for use in lithography, method of making a mask,... Mask for use in lithography, method of making a mask,...

2005-08-09

2005-08-09

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06927004

ABSTRACT:
A reflective mask has a sub-resolution texture applied to absorbing areas to reduce the amount of power in the specular reflection. The texture may form a phase contrast grating or may be a diffuser. The same technique may be applied to the other absorbers in a lithographic apparatus.

REFERENCES:
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5501925 (1996-03-01), Smith et al.
patent: 5624773 (1997-04-01), Pforr et al.
patent: 5641593 (1997-06-01), Watanabe et al.
patent: 2001/0051304 (2001-12-01), Stivers et al.
patent: 0 757 262 (1997-02-01), None

Affiliated with

Also associated with

Rating

Mask for use in lithography, method of making a mask,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask for use in lithography, method of making a mask,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask for use in lithography, method of making a mask,... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3445711