Printable assist lines and the removal of such

Details Printable assist lines and the removal of such Printable assist lines and the removal of such

2005-08-16

2005-08-16

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S394000

Reexamination Certificate

active

06929887

ABSTRACT:
A new method of applying FSAF is provided that optimizes the distribution of the spatial frequency and the unification of the photolithographic exposure level. The FSAF are removed by an additional exposure, using a specially designed mask that contains erasing features at the location of the FSAF.

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patent: 6387596 (2002-05-01), Cole et al.
“Resolution Enhancement Techniques in Optical Lithography,” by Alfred Kwok-Kit Wang, Tutorial Texts in Optical Engineering, Vol. TT47, SPIE Press, Copyright 2001.

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