Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2005-01-25
2005-01-25
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237100, C250S559270
Reexamination Certificate
active
06847443
ABSTRACT:
A system and method for detecting defects in surface structures, such as those formed on semiconductor wafers. A light source, preferably a strobe light, provides illumination that is separated by a filter into a plurality of selected bandwidths. The light then is transported through a fiber optic cable to a diffuser, and from there directed toward the surface. A camera captures a plurality of images, each image formed by a separate portion of the electromagnetic spectrum. The images may be formed by either reflected or diffracted light, or both. The images may be stored or compared to an image of a calibration wafer.
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Herod David W.
Lin Youling
Nguyen Sang H.
Rudolph Technologies, Inc.
Toatley , Jr. Gregory J.
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