Surface cleanliness measurement with infrared spectroscopy

Details Surface cleanliness measurement with infrared spectroscopy Surface cleanliness measurement with infrared spectroscopy

2005-10-18

2005-10-18

Le, Que T. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

C250S574000

Reexamination Certificate

active

06956228

ABSTRACT:
A method is provided for determining an amount of a contaminant on a surface. Base values of infrared energy reflected from the surface without the contaminant at first and second wavelengths is determined. The values of infrared energy reflected from the surface with the contaminant at the first and second wavelengths are also determined. The values of infrared energy absorbed by the contaminant on the surface are determined at the first and second wavelengths. A difference of the absorbance at the first and second wavelengths is determined. The difference is correlated to an amount of the contaminant on the surface.

REFERENCES:
patent: 4657390 (1987-04-01), Doyle
patent: 4791296 (1988-12-01), Carpio
patent: 4800279 (1989-01-01), Hieftje et al.
patent: 5015856 (1991-05-01), Gold
patent: 5381228 (1995-01-01), Brace
patent: 5714758 (1998-02-01), Neu
patent: 5952660 (1999-09-01), Kip et al.
patent: 6788405 (2004-09-01), Hunt
patent: 100 10 839 (2001-09-01), None
patent: 1 380 725 (1975-01-01), None
Townshend, A. (Ed): “Encyclopedia of Analytical Science, PASSAGE” Encyclopedia of Analytical Science, XX, XX, 1995, pp. 4930-4932, XP002259402 the whole document.

Affiliated with

Also associated with

Rating

Surface cleanliness measurement with infrared spectroscopy does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Surface cleanliness measurement with infrared spectroscopy, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Surface cleanliness measurement with infrared spectroscopy will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3437256