Conductive film forming composition, conductive film, and...

Coating processes – Electrical product produced – Metal coating

Reexamination Certificate

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C427S097100, C427S553000, C427S558000

Reexamination Certificate

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06953600

ABSTRACT:
There are provided a conductive film forming composition capable of forming wiring or an electrode which can be suitably used in a variety of electronic devices, easily and inexpensively, a method for forming a film using the composition, a conductive film formed by the method, and wiring or an electrode which comprises the film.A conductive film forming composition comprising a complex of an amine compound and aluminum hydride and an organic solvent is applied on a substrate and then subjected to a heat treatment and/or irradiation with light, whereby a conductive film such as an electrode or wiring is produced.

REFERENCES:
patent: 1212817 (1966-03-01), None
patent: 2248853 (1992-04-01), None
Baum et al “Laser-induced chemical vapor deposition of aluminum”, Appl. Phys. Lett. 55(12) Sep. 1989 pp 1264-1266.
J. K. Ruff, et al., J. Amer. Chem. Soc., vol. 82, pp. 2141-2144, “The Amine Complexes of Aluminum Hydride. I.”, May 5, 1960.
G. W. Fraser, et al., J. Amer. Chem. Soc., pp. 3742-3749, “Aluminum Hydride Adducts of Trimethylamine: Vibrational Spectra and Structure”, 1963.
J. L. Atwood, et al., J. Amer. Chem. Soc., vol. 113, pp. 8183-8185, “Tertiary Amine Stabilized Dialane”, 1991.

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