Processes for vacuum treating workpieces, and corresponding...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching

Reexamination Certificate

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C438S710000, C438S716000, C414S217000, C118S500000

Reexamination Certificate

active

06890862

ABSTRACT:
A process for the vacuum treatment of workpieces, includes loading the workpieces into a treatment facility, surface treating the workpieces in at least one vacuum station of the facility grouped as a station batch and controlling at least the timing of the process by a freely programmable process controller unit. At least two stations operating each on workpiece batches can be grouped as respective station batches and be different with respect to number of workpieces. The workpieces can be transported to and from the grouped stations. An embodiment of vacuum treatment system for such a process includes at least one vacuum treatment station for workpieces grouped as a station batch. A transport system supplies the vacuum station with workpieces. A process controller unit has an output operationally connected to a drive arrangement for the transport system. The unit controls operating timing of the treatment system and is freely programmable.

REFERENCES:
patent: 5019233 (1991-05-01), Blake et al.
patent: 5167716 (1992-12-01), Boitnott et al.
patent: 5344542 (1994-09-01), Maher et al.
patent: 5590994 (1997-01-01), Schertler
patent: 5693238 (1997-12-01), Schmitt et al.
patent: 5944857 (1999-08-01), Edwards et al.
patent: 6214751 (2001-04-01), Lee
patent: 6224312 (2001-05-01), Sundar
patent: 4412902 (1974-11-01), None
patent: 608620 (1996-08-01), None

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