Substrate cleaning apparatus and method

Details Substrate cleaning apparatus and method Substrate cleaning apparatus and method

2005-09-13

2005-09-13

Barr, Michael (Department: 1746)

Cleaning and liquid contact with solids

Processes

Using solid work treating agents

C134S033000, C134S902000, C015S077000, C015S088300, C015S102000

Reexamination Certificate

active

06942737

ABSTRACT:
A substrate is supported at a plurality of edge positions thereof, to be in horizontal posture, by support pins erected on a spin chuck. A two-fluid nozzle is fixed to a position spaced from and directly over edges of the substrate to clean the edges. Substantially simultaneously therewith, a cleaning brush cleans the substrate while swinging over, in direct contact with, areas other than the edges of the substrate. The two-fluid nozzle delivers mist in a small quantity and in minute droplets. The mist is restrained from rebounding and scattering from the plurality of edge positions supported by the support pins of the spin chuck. The mist may be supplied to clean such positions.

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