Pinch-off type vertical junction field effect transistor and...

Active solid-state devices (e.g. – transistors – solid-state diode – Specified wide band gap semiconductor material other than... – Diamond or silicon carbide

Reexamination Certificate

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C257S263000, C257S264000, C257S266000, C257S268000, C257S269000, C257S285000, C257S287000

Reexamination Certificate

active

06870189

ABSTRACT:
A junction field effect transistor (JFET) is provided that is capable of a high voltage resistance, high current switching operation, that operates with a low loss, and that has little variation. This JFET is provided with a gate region (2) of a second conductivity type provided on a surface of a semiconductor substrate, a source region (1) of a first conductivity type, a channel region (10) of the first conductivity type that adjoins the source region, a confining region (5) of the second conductivity type that adjoins the gate region and confines the channel region, a drain region (3) of the first conductivity type provided on a reverse face, and a drift region (4) of the first conductivity type that continuously lies in a direction of thickness of the substrate from a channel to a drain. A concentration of an impurity of the first conductivity type in the drift region and the channel region is lower than a concentration of an impurity of the first conductivity type in the source region and the drain region and a concentration of an impurity of the second conductivity type in the confining region.

REFERENCES:
patent: 5391897 (1995-02-01), Nonaka
patent: 5396085 (1995-03-01), Baliga
patent: 6313482 (2001-11-01), Baliga
patent: 53078177 (1978-07-01), None
patent: 04273169 (1992-09-01), None
Mitlehner et al., Article Entitled: “Dynamic characteristics of high voltage 4H-SiC vertical JFETs.”; 1999 IEEE; pp. 339-342.

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