High purity tantalum, products containing the same, and...

Metal treatment – Stock – Vanadium – niobum – or tantalum base

Reexamination Certificate

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C420S427000

Reexamination Certificate

active

06893513

ABSTRACT:
High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99.995% and more preferably at least 99.999%. In addition, tantalum metal and alloys thereof are described, which either have a grain size of about 50 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 15 random, or an incremental log ratio of (111):(100) intensity of greater than about −4.0, or any combination of these properties. Also described are articles and components made from the tantalum metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity metal which includes the step of reacting a salt-containing tantalum with at least one compound capable of reducing this salt to tantalum powder and a second salt in a reaction container. The reaction container or liner in the reaction container and the agitator or liner on the agitator are made from a metal material having the same or higher vapor pressure of melted tantalum. The high purity tantalum preferably has a fine and uniform microstructure.

REFERENCES:
patent: 2950185 (1960-09-01), Hellier et al.
patent: 2992095 (1961-07-01), Li
patent: 3085871 (1963-04-01), Griffiths
patent: 3110585 (1963-11-01), Scheller et al.
patent: 3268328 (1966-08-01), Torti, Jr.
patent: 3335037 (1967-08-01), Dunn et al.
patent: 3497402 (1970-02-01), Douglass et al.
patent: 3597192 (1971-08-01), Wilhelm et al.
patent: 3647420 (1972-03-01), Restelli
patent: 3653850 (1972-04-01), Eberts
patent: 3878079 (1975-04-01), Schauer
patent: 3925187 (1975-12-01), Bernard
patent: 3955039 (1976-05-01), Roschy et al.
patent: 3995039 (1976-11-01), Rooney et al.
patent: 4032328 (1977-06-01), Hurd
patent: 4141719 (1979-02-01), Hakko
patent: 4231790 (1980-11-01), Hahn et al.
patent: 4490340 (1984-12-01), Ritsko et al.
patent: 4600448 (1986-07-01), Schmidt et al.
patent: 4619695 (1986-10-01), Oikawa et al.
patent: 4673554 (1987-06-01), Niwa et al.
patent: 4727928 (1988-03-01), De Vynck et al.
patent: 4786468 (1988-11-01), Wang et al.
patent: 4842706 (1989-06-01), Fukasawa et al.
patent: 4877445 (1989-10-01), Okudaira et al.
patent: 4960163 (1990-10-01), Fang et al.
patent: 5013357 (1991-05-01), Worcester et al.
patent: 5068097 (1991-11-01), Eckert et al.
patent: 5087297 (1992-02-01), Pouliquen
patent: RE34035 (1992-08-01), Dimigen et al.
patent: 5143590 (1992-09-01), Strothers et al.
patent: 5196916 (1993-03-01), Ishigami et al.
patent: 5204057 (1993-04-01), Ishigami et al.
patent: 5234487 (1993-08-01), Wickersham et al.
patent: 5234491 (1993-08-01), Chang
patent: 5269403 (1993-12-01), Pouliquen et al.
patent: 5342571 (1994-08-01), Dittmar et al.
patent: 5406850 (1995-04-01), Bouchard et al.
patent: 5442978 (1995-08-01), Hildreth et al.
patent: 5449445 (1995-09-01), Shinneman et al.
patent: 5455197 (1995-10-01), Ghanbari et al.
patent: 5464711 (1995-11-01), Mogab et al.
patent: 5470527 (1995-11-01), Yamanobe et al.
patent: 5474667 (1995-12-01), Hurwitt et al.
patent: 5490914 (1996-02-01), Hurwitt et al.
patent: 5522535 (1996-06-01), Ivanov et al.
patent: 5529673 (1996-06-01), Strauss et al.
patent: 5530467 (1996-06-01), Ishigami et al.
patent: 5541007 (1996-07-01), Ueda et al.
patent: 5573572 (1996-11-01), Eckert et al.
patent: 5584906 (1996-12-01), Ishigami et al.
patent: 5590385 (1996-12-01), Paik
patent: 5590389 (1996-12-01), Dunlop et al.
patent: 5595337 (1997-01-01), Demaray et al.
patent: 5630918 (1997-05-01), Takahara et al.
patent: 5632869 (1997-05-01), Hurwitt et al.
patent: 5635146 (1997-06-01), Singh et al.
patent: 5656216 (1997-08-01), Lo et al.
patent: 5674367 (1997-10-01), Hunt et al.
patent: 5687600 (1997-11-01), Emigh et al.
patent: 5693203 (1997-12-01), Ohhashi et al.
patent: 5700419 (1997-12-01), Matsunaga et al.
patent: 5707599 (1998-01-01), Northway
patent: 5709783 (1998-01-01), Sanchez et al.
patent: 5722034 (1998-02-01), Kambara
patent: 5733427 (1998-03-01), Satou et al.
patent: 5736657 (1998-04-01), Ide et al.
patent: 5741404 (1998-04-01), Cathey
patent: 5753090 (1998-05-01), Obinata
patent: 5766380 (1998-06-01), Lo et al.
patent: 5772860 (1998-06-01), Sawada et al.
patent: 5809393 (1998-09-01), Dunlop et al.
patent: 6193821 (2001-02-01), Zhang
patent: 6238494 (2001-05-01), Segal
patent: 6323055 (2001-11-01), Rosenberg et al.
patent: 6331233 (2001-12-01), Turner
patent: 6348113 (2002-02-01), Michaluk et al.
patent: 6348139 (2002-02-01), Shah et al.
patent: 20010001401 (2001-05-01), Segal
patent: 20020063056 (2002-05-01), Shah et al.
patent: 20020132388 (2002-09-01), Rosenberg et al.
patent: 20020153248 (2002-10-01), Shah et al.
patent: 252442 (1960-06-01), None
patent: 198 41 774 (1998-09-01), None
patent: 19841774 (1999-03-01), None
patent: 08700365 (1987-06-01), None
patent: 0 285 741 (1988-01-01), None
patent: 04032566 (1990-10-01), None
patent: 0 590 904 (1993-09-01), None
patent: 23479894 (1994-04-01), None
patent: 0 902 102 (1999-03-01), None
patent: 0 281 141 (2000-06-01), None
patent: 955832 (1964-04-01), None
patent: 55-48512 (1980-04-01), None
patent: 55-179784 (1980-12-01), None
patent: 58-77813 (1983-04-01), None
patent: 58-231036 (1983-12-01), None
patent: 59-131291 (1984-06-01), None
patent: 60-122751 (1985-06-01), None
patent: 60-247022 (1985-11-01), None
patent: 60-299441 (1985-12-01), None
patent: 61-85746 (1986-04-01), None
patent: 61-133802 (1986-06-01), None
patent: 62-227856 (1987-09-01), None
patent: 62-229730 (1987-09-01), None
patent: 62-232678 (1987-09-01), None
patent: WO 8707650 (1987-12-01), None
patent: S 62-297-463 (1987-12-01), None
patent: 19880119079 (1988-05-01), None
patent: 01-289559 (1989-11-01), None
patent: 401290766 (1989-11-01), None
patent: 01-334805 (1989-12-01), None
patent: 02-102790 (1990-04-01), None
patent: 02-123021 (1990-05-01), None
patent: 03-082773 (1991-04-01), None
patent: 03-197640 (1991-08-01), None
patent: 03197640 (1991-08-01), None
patent: 04178940 (1992-06-01), None
patent: 06264232 (1994-09-01), None
patent: 6-264232 (1994-09-01), None
patent: 406264232 (1994-09-01), None
patent: 6(1994)-264232 (1994-09-01), None
patent: WO 9961670 (1999-12-01), None
patent: WO 9966100 (1999-12-01), None
patent: WO 0216667 (2002-02-01), None
Clark et al., “Influence of Initial Ingot Breakdown on the Microstructural and Textural Evelopment of High-Purity Tantalum”, Metallurgical Transactions A:Physical Metallurgy and Materials Sxience, vol. 22A (12), Dec. 1991, pp. 2959-2968.*
Wright, “A Review of Automated Orientation Imaging Microscopy (OIM)”Journal of Computer-Assisted Microscopy, vol. 5, No. 3, pp. 207-221, (1993), no month data.
Arlt, Jr. “Sulfonation and Sulfation to Thorium and Thorium Compounds”Kirk-Othmer Encyclopedia of Chemical Technologyvol. 22, pp. 541-564, (1993), no month data.
Wright, “A comparison of different texture analysis techniques”Textures of Materials: Proceedings of the Eleventh International Conference on Textures of Materials, International Academic Publishers, pp. 53-62 (1996), no month data.
Adams, et al. “Orientation Imaging: The Emergence of a New Microscopy”Metallurgical Transactions, vol. 24A-No. 4. pp. 819-831 (1993), no month data.
Adams, et al., “Orientation Imaging Microscopy: New Possibilities for Microstructural Investigations Using Automated BKD Analysis”Materials Science Forumvol. 157-162 (1994) pp. 31-42, no month data.
Matthies et al., “On the Geometric Mean of Physical Tensors using Orientation Distributions”Materials Science Forumvol. 157-162 (1994) pp. 1647-1652, no month data.
Matthies, et al. “On some Methodical Developments Concerning Calculations Performed Directly in the Orientation Space”Materials Science Forumvol. 157-162 (1994) pp. 1641-1646, no month data.
International Search Report mailed Apr. 12, 2000.
Kock, et al. “Tantalum-Processing, Properties and Applications” JOM vol. 41., No. 10, pp. 33-39. (1989

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