Dynamic use of process temperature

Details Dynamic use of process temperature Dynamic use of process temperature

2005-04-12

2005-04-12

Meeks, Timothy (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

C427S255290, C427S255394, C427S255400

Reexamination Certificate

active

06878406

ABSTRACT:
A process for reacting a gaseous species with a substrate includes placing the substrate in a space, heating the space, introducing the gaseous species into the space, and cooling the space. Introducing the gaseous species into the space includes introducing the gaseous species into the space before the substrate reaches a steady state temperature and/or reacting the gaseous species with the substrate includes reacting the gaseous species with the substrate while cooling the space.

REFERENCES:
patent: 5244831 (1993-09-01), Hindman et al.
patent: 5840368 (1998-11-01), Ohmi
patent: 6211081 (2001-04-01), Mikata
patent: 6296709 (2001-10-01), Krivokapic
patent: 6387777 (2002-05-01), Hurley
Pierson, Handbook of Chemical Vapor Deposition (1992), pp. 225 and 232.

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