Titanium dioxide cobalt magnetic film and its manufacturing...

Details Titanium dioxide cobalt magnetic film and its manufacturing... Titanium dioxide cobalt magnetic film and its manufacturing...

2005-07-19

2005-07-19

Bernatz, Kevin M. (Department: 1773)

Stock material or miscellaneous articles

All metal or with adjacent metals

Composite; i.e., plural, adjacent, spatially distinct metal...

C428S686000, C428S692100, C427S529000, C427S128000

Reexamination Certificate

active

06919138

ABSTRACT:
A mixture of TiO2and Co is placed in a vacuum chamber under selected oxygen pressure and irradiated in the vacuum chamber with a selected laser light to cause TiO2and Co to evaporate from the target and a layer of TiO2-Co to epitaxially grow on a heated single crystal substrate. The titanium dioxide-cobalt magnetic film for use in a photocatalyst, a semiconductor material having optical, electrical and magnetic functions, and a transparent magnet. The film is expressed by Ti1-xCoxO2where 0<x≦0.3, and wherein a Ti atom at its lattice position is replaced with a Co atom. The film has anatase or rutile crystalline structure, has its band gap energy varying in a range between 3.13 eV and 3.33 eV, retains its magnetization even at a temperature higher than a room temperature, and is transparent to visible light.

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Matsumoto, Y., Murakami, M., Shono, T., Hasegaw, T., Fukumura, T., Kawasaki, M., Ahmet, P., Chikyow, T., Koshihara, S., and Koinuma, H., Science, Feb. 2001, 291, 854-856.

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