Technique for high efficiency metalorganic chemical vapor...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material

Reexamination Certificate

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C438S597000, C438S680000, C438S681000, C438S686000

Reexamination Certificate

active

06921710

ABSTRACT:
A technique for more efficiently forming conductive elements, such as conductive layers and electrodes, using chemical vapor deposition. A conductive precursor gas, such as a platinum precursor gas, having organic compounds to improve step coverage is introduced into a chemical vapor deposition chamber. A reactant is also introduced into the chamber that reacts with residue organic compounds on the conductive element so as to remove the organic compounds from the nucleating sites to thereby permit more efficient subsequent chemical vapor deposition of conductive elements.

REFERENCES:
patent: 5104684 (1992-04-01), Tao et al.
patent: 5130172 (1992-07-01), Hicks et al.
patent: 5204314 (1993-04-01), Kirlin et al.
patent: 5322712 (1994-06-01), Norman et al.
patent: 5403620 (1995-04-01), Kaesz et al.
patent: 5552327 (1996-09-01), Bachmann et al.
patent: 5576071 (1996-11-01), Sandhu
patent: 5672385 (1997-09-01), Jimba et al.
patent: 5763007 (1998-06-01), Weiller
patent: 5783716 (1998-07-01), Baum et al.
patent: 5789027 (1998-08-01), Watkins et al.
patent: 5902651 (1999-05-01), Westmoreland et al.
patent: 5990559 (1999-11-01), Marsh
patent: 6010744 (2000-01-01), Buskirk et al.
patent: 6140230 (2000-10-01), Li
patent: 6146608 (2000-11-01), Todd et al.
patent: 6162712 (2000-12-01), Baum et al.
patent: 6180974 (2001-01-01), Okutoh et al.
patent: 6201271 (2001-03-01), Okutoh et al.
patent: 6204172 (2001-03-01), Marsh
patent: 6210745 (2001-04-01), Gaughan et al.
patent: 6271131 (2001-08-01), Uhlenbrock et al.
patent: 6329286 (2001-12-01), Vaartstra
patent: 6403414 (2002-06-01), Marsh
patent: 6475854 (2002-11-01), Narwankar et al.
patent: 6576538 (2003-06-01), Li et al.
patent: 6605735 (2003-08-01), Kawano et al.
patent: 6689700 (2004-02-01), Watkins et al.
patent: 2001/0000865 (2001-05-01), Gaughen et al.
patent: 2001/0043453 (2001-11-01), Narwankar et al.
patent: 2001/0044207 (2001-11-01), Marsh
patent: 2002/0076492 (2002-06-01), Loan et al.
patent: 2003/0100183 (2003-05-01), Li et al.
Irving, Optical Diagnostics for Thin Film Processing, Academic Press, 1996, p. 29.

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