Semiconductor exposure apparatus, control method therefor,...

Details Semiconductor exposure apparatus, control method therefor,... Semiconductor exposure apparatus, control method therefor,...

2005-04-05

2005-04-05

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

C355S053000

Reexamination Certificate

active

06876438

ABSTRACT:
An exposure apparatus performs a second transfer of a pattern of a second mask onto a second substrate, with the second substrate having a layer formed through a first transfer of a pattern of a first mask onto a first substrate. The apparatus includes a movable stage which holds the second substrate, and a measuring unit which measures a height of the second substrate relative to a plane at which the second substrate is to be exposed. In addition, a control unit controls a position of the stage based on the height measured by the measuring unit and a height of the first substrate previously measured relative to a plane at which the first substrate is to be exposed.

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patent: 2-100311 (1990-04-01), None

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