Drying and gas or vapor contact with solids – Apparatus – Vacuum
Reexamination Certificate
2005-05-17
2005-05-17
Lu, Jiping (Department: 3749)
Drying and gas or vapor contact with solids
Apparatus
Vacuum
C034S108000, C034S185000, C432S112000, C432S118000
Reexamination Certificate
active
06892471
ABSTRACT:
A material drying apparatus for substantially eliminating the liquid content of a sludge, the apparatus including a first stage operating at ambient pressure for heating the sludge; a second stage operating with partial vacuum for receiving heated sludge from the first stage for further heating and for drying the sludge by evaporation of substantially all liquid therefrom leaving a dry particulate material; and an evacuated cyclonic stage for applying sufficient centrifugal force to the dry particulate material to render this material odorless.
REFERENCES:
patent: 144358 (1873-11-01), Root et al.
patent: 3214352 (1965-10-01), Wells
patent: 3826718 (1974-07-01), Takayasu
patent: 3859052 (1975-01-01), Walther
patent: 3997406 (1976-12-01), Arvanitakis
patent: 4109019 (1978-08-01), Moore
patent: 4198265 (1980-04-01), Johnson
patent: 4296072 (1981-10-01), Takacs et al.
patent: 5028298 (1991-07-01), Baba et al.
patent: 5103578 (1992-04-01), Rickard
patent: 5137604 (1992-08-01), Meeks et al.
patent: 5245762 (1993-09-01), Hartis et al.
patent: 5325605 (1994-07-01), Carew
patent: 5531866 (1996-07-01), Pathak et al.
patent: 5545296 (1996-08-01), Pathak et al.
patent: 5575894 (1996-11-01), Foral
patent: 5580426 (1996-12-01), Ganeshan
patent: 5609735 (1997-03-01), Hetzel et al.
patent: 5669419 (1997-09-01), Haas
patent: 5733417 (1998-03-01), Foral
patent: 5871619 (1999-02-01), Finley et al.
Davis & Bujold P.L.L.C.
Lu Jiping
LandOfFree
Sludge dryer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Sludge dryer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sludge dryer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3419569