Antireflection film

Details Antireflection film Antireflection film

2005-04-26

2005-04-26

Dye, Rena (Department: 1774)

Stock material or miscellaneous articles

Structurally defined web or sheet

Including components having same physical characteristic in...

C428S297100, C428S315900, C428S304400, C428S001500, C428S001510, C428S323000, C428S697000, C428S702000

Reexamination Certificate

active

06884495

ABSTRACT:
An antireflection film is formed of an organic film, a hard hard coating layer on the organic film, a first layer coated on the hard coating layer, and a second layer having an index of refraction lower than that of the first layer and coated on the first layer. The first layer is formed of a synthetic resin having pores therein and metallic oxide particles contained in the synthetic resin. The metallic oxide is at least on selected from the group consisting of ZrO1, TiO2, NbO, ITO, ATO, SbO2, In2O3, SnO2and ZnO. The synthetic resin is ultraviolet ray curable resin or electron beam curable resin. The second layer partly enters the pores of the first layer to firmly bond to the first layer through the pores.

REFERENCES:
patent: 4687707 (1987-08-01), Matsuo et al.
patent: 6177131 (2001-01-01), Glaubitt et al.
patent: 6335832 (2002-01-01), Oka et al.
patent: 0 359 026 (1990-03-01), None
Patent Abstracts of Japan; Publication No. 59204801; Publication date Nov. 20, 1984; Applicant Konishiroku Photo Ind. Co Ltd.

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