Exposure apparatus and method of manufacturing a...

Details Exposure apparatus and method of manufacturing a... Exposure apparatus and method of manufacturing a...

2005-04-26

2005-04-26

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000, C355S072000

Reexamination Certificate

active

06885431

ABSTRACT:
An exposure apparatus has a structure supported by a vibration isolating mechanism and a partition wall inserted in at least part of the optical path of exposure light used in the exposure apparatus. The structure and partition wall are coupled by an elastic seal member to form a closed space, and the interior of the partition wall is partitioned from the remaining space.

REFERENCES:
patent: 5559584 (1996-09-01), Miyaji et al.
patent: 5881987 (1999-03-01), Hara
patent: 6341006 (2002-01-01), Murayama et al.
patent: 6493062 (2002-12-01), Tokuda et al.
patent: 6493065 (2002-12-01), Ina et al.
patent: 6621556 (2003-09-01), Iwasaki et al.
patent: 20020018190 (2002-02-01), Nogawa et al.
patent: 20020163631 (2002-11-01), Sogard
patent: 20040017556 (2004-01-01), Nakahara
patent: 1 069 448 (2000-07-01), None
patent: 6-260385 (1994-09-01), None
patent: 8-279458 (1996-10-01), None
patent: 2001-27727 (2001-01-01), None
Okabe, Hideo. “Photochemistry of Small Molecules,” A Wiley-Interscience Publication, 1978, pp. 178-179.

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