System and method for reducing charged particle contamination

Details System and method for reducing charged particle contamination System and method for reducing charged particle contamination

2005-05-17

2005-05-17

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C216S062000, C056S135000

Reexamination Certificate

active

06894294

ABSTRACT:
A system and method for reducing ion contamination in an object, the ion contamination introduced by a contaminating ion beam milling step. The system includes means for defining a suspected ion contaminated area; and means for removing the suspected ion contaminated area by a non-contaminating process, which usually involves directing an electron beam towards the removed area while allowing the beam to interact with additional material. The method includes the steps of defining a suspected ion contaminated area; and removing the suspected ion contaminated area by non-contaminating process.

REFERENCES:
patent: 4226666 (1980-10-01), Winters et al.
patent: 5288368 (1994-02-01), DeMarco et al.
patent: 20020195422 (2002-12-01), Slevers et al.

Affiliated with

Also associated with

Rating

System and method for reducing charged particle contamination does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for reducing charged particle contamination, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for reducing charged particle contamination will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3413749