Cleaning solution for removing photoresist

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...

Reexamination Certificate

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Details

C510S175000, C510S255000, C134S002000, C134S042000, C430S331000

Reexamination Certificate

active

06841526

ABSTRACT:
Cleaning solutions for removing photoresist materials and a method of forming underlying layer patterns of semiconductor devices using the same. The cleaning solutions for removing photoresist include a solvent mixture of H2O and an organic solvent, an amine compound, a transition metal-removing material and an alkali metal-removing material, and may further include a hydrazine hydrate.

REFERENCES:
patent: 5496491 (1996-03-01), Ward et al.
patent: 5902780 (1999-05-01), Lee
patent: 6367486 (2002-04-01), Lee et al.

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