Developing apparatus and developing method

Details Developing apparatus and developing method Developing apparatus and developing method

2005-03-22

2005-03-22

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C396S611000, C396S627000, C118S052000, C427S240000

Reexamination Certificate

active

06869234

ABSTRACT:
A substrate (SW) is rotatably held in an approximately horizontal position by a wafer holding and rotation mechanism (810). One end of a rinsing liquid supply nozzle (840) is rotatably supported by a rinsing liquid supply nozzle rotation supporting mechanism (850) to pass over the substrate (SW). In response to rotation of the rinsing liquid supply nozzle (840), the rotation axis of the rinsing liquid supply nozzle (840) moves in a direction closer to or away from the rotation axis of the substrate (SW), whereby the amount of projection of a tip portion of the rinsing liquid supply nozzle (840) is reduced.

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patent: 6051101 (2000-04-01), Ohtani et al.
patent: 6092937 (2000-07-01), Snodgrass et al.
patent: 6183810 (2001-02-01), Ota
patent: 6270579 (2001-08-01), Subramanian et al.
patent: 10-020508 (1998-01-01), None
patent: 10-340836 (1998-12-01), None
patent: 11-267573 (1999-10-01), None
patent: 3352417 (2002-09-01), None

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