Etching apparatus

Details Etching apparatus Etching apparatus

2005-01-18

2005-01-18

Tanner, Harry B. (Department: 3744)

Refrigeration

Automatic control

Of external fluid or means

C062S201000, C118S666000, C438S005000

Reexamination Certificate

active

06843069

ABSTRACT:
An etching apparatus of the present invention has a processing device having a reaction chamber in which an electrode provided with a built-in refrigerant-circulating path is installed, a refrigerator for cooling the refrigerant at a predetermined temperature and circulating the refrigerant in the refrigerant-circulating path at a predetermined flow rate, a controlling device for controlling the temperature or flow rate of the refrigerant, a status monitor for monitoring an operational status, and a temperature control device for controlling the temperature of the electrode by controlling the temperature or flow rate of the refrigerant on the basis of information about the operational status.

REFERENCES:
patent: 6427462 (2002-08-01), Suenaga et al.
patent: 6553775 (2003-04-01), Togaru et al.
patent: 62-281423 (1987-12-01), None
patent: 09-172001 (1997-06-01), None
patent: 10-223499 (1998-08-01), None
patent: 2001-093883 (2001-04-01), None
patent: 2002-270579 (2002-09-01), None

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