Method and apparatus for inspecting patterns

Details Method and apparatus for inspecting patterns Method and apparatus for inspecting patterns

2005-05-03

2005-05-03

Boudreau, Leo (Department: 2621)

Image analysis

Applications

Manufacturing or product inspection

C382S288000, C382S209000, C382S216000

Reexamination Certificate

active

06888958

ABSTRACT:
The difference data between the real patter data Sij, and a 5×5 window with a noticed pixel in the center and the design pattern data Rij obtained by the design pattern data of the window being shifted in a plurality of directions with respect to the design pattern data Rij is found by a shift direction operation section, and the design pattern data in the direction in which the total of the pixels is minimum is selected from the difference data by a selection section, the difference between the central pixels Sij, Qij of the selected design pattern data and the central pixels Sij, Qij of the windows of the real pattern data is found by a difference operation section, and the difference and a threshold are compared in a defect judgement section, and thereby the pattern inspection of the object is carried out.

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