Energy beam exposure method and exposure apparatus

Radiant energy – Irradiation of objects or material

Reexamination Certificate

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C250S492220, C250S398000

Reexamination Certificate

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06897454

ABSTRACT:
An exposure method using an energy beam exposure apparatus capable of controlling magnitude relation between blurs of energy beam in first and second directions for exposing a pattern on a sample in the apparatus in a state in which the blur of energy beam in one direction of the first and second directions is set smaller than the blur of energy beam in the other direction comprises adjusting the magnitude relation of the blurs of energy beam in the first and second directions, adjusting the direction of the sample in the apparatus on the basis of the pattern and the magnitude relation of the blurs of energy beam in the first and second directions, and projecting the pattern onto the sample by exposing the sample to the energy beam and using shape correction of the pattern needed to compensate blurs of energy beam in the first and second directions.

REFERENCES:
patent: 5396077 (1995-03-01), Sohda et al.
patent: 5929457 (1999-07-01), Okino
patent: 6559456 (2003-05-01), Muraki
patent: 6703629 (2004-03-01), Nakasugi
patent: 2000-012426 (2000-01-01), None
Nakasugi, T., Charged Beam Exposure Apparatus Having Blanking Aperture and Basic Figure Aperture, U.S. Appl. No. 09/912,365, filed Jul. 26, 2001.

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