Monomer having electron-withdrawing group and process for...

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...

Reexamination Certificate

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C526S266000, C526S247000

Reexamination Certificate

active

06949615

ABSTRACT:
A monomer containing an electron-withdrawing group of the present invention is represented by following Formula (a), (b) or (c):wherein A1, A2, and A3are each a ring; Ra, Rb, Rc, and Ruare the same or different and are each a hydrogen atom or organic group; at least one of Rs, Rwand Rv, at least one of Rtand Rw1, and at least one of the two Rw2s are each an electron-withdrawing group, and the others are each a hydrogen atom or organic group; W1is a single bond or linkage group; and n denotes an integer of 2 to 25, where at least two of Ra, Rb, Rc, Rs, Rt, Ru, Rv, Rw, Rw1, Rw2, W1, and carbon atoms constituting ring A1, carbon atoms constituting ring A2, and carbon atoms constituting ring A3may be combined to form a ring, respectively. The electron-withdrawing groups in Rs, Rt, Rv, Rw, Rw1, and Rw2are, for example, groups each containing a fluorine atom. The monomer is useful as a raw material for photoresist polymeric compounds.

REFERENCES:
patent: 2928865 (1960-03-01), Brasen
patent: 0 157262 (1985-09-01), None
patent: 0 157 262 (1985-10-01), None
patent: 64-22866 (1989-01-01), None
patent: 02-004722 (1990-01-01), None
patent: WO 00/17712 (2000-03-01), None
Cho et al., “Negative tone 193 nm resists”, Proceedings of SPIE, 3999, 62-69(2000).
Chiba et al., “157 nm resist materials: a progress report”, Journal of photopolymer science and technology, 13(4), 657-664(2000).
Ito et al., Polym. Mater. Sci. Eng., 77, 449-450 (1997).
Chiba et al., J. of photopolymer Science and Technology, 13(4),657-664(2000).
Ito et al., ACS Symposium Series, 706, 208-223 (1998).
Cho et al., Adv. in Resist Technologyand Processing XVII, Proceedings of SPIE, 3999, 62-73(2000).
Huque et al., J. Chem. Res., Synop. No. 7, pp. 214 (1987).
Snatzke et al., Chem. Ber., vol. 105, No. 1, pp. 244-256 (1972).
Dua et al., J. Chem. Soc., Perkin Trans. 2, No. 6, pp. 1443-1448 (1998).
Shono et al., Chem. Lett., No. 1, pp. 69-72 (1979).
Hartke et al., Liebigs Ann. Chem., No. 11, pp. 1665-1676 (1980).
Laduron et al., J. Prakt. Chem./Chem.—Ztg., vol. 339, No. 8, pp. 697-707 (1997).
Burdon et al., Tetrahedron, vol. 27, No. 19, pp. 4533-4551 (1971).
Ito et al., Polym. Mater. Sci. Eng., No. 77, pp. 449-450 (1997).
Morihira et al., Bioorg. Med. Chem. Lett., vol. 8, No. 21, pp. 2977-2982 (1998).
Vedejs et al., J. Org. Chem, vol. 44, No. 18, pp. 3230-3238 (1979).

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