Substrate processing apparatus and semiconductor device...

Details Substrate processing apparatus and semiconductor device... Substrate processing apparatus and semiconductor device...

2005-03-08

2005-03-08

Fuqua, Shawntina (Department: 3742)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C219S405000, C219S490000, C219S502000, C219S411000, C219S505000, C219S497000, C392S418000, C392S416000

Reexamination Certificate

active

06864463

ABSTRACT:
Emissivity of a substrate is measured at least before the substrate is heated, heating operation of the substrate is controlled under a heating condition corresponding to the emissivity, and the substrate is processed.

REFERENCES:
patent: 5315092 (1994-05-01), Takahashi et al.
patent: 5334251 (1994-08-01), Nashimoto
patent: 5814365 (1998-09-01), Mahawili
patent: 5951896 (1999-09-01), Mahawili
patent: 6090212 (2000-07-01), Mahawili
patent: 11-329992 (1999-11-01), None

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