Method and device for coating substrates

Details Method and device for coating substrates Method and device for coating substrates

2005-07-12

2005-07-12

Hassanzadeh, Parviz (Department: 1763)

Coating processes

Direct application of electrical, magnetic, wave, or...

Chemical vapor deposition

C427S575000, C118S7230MW

Reexamination Certificate

active

06916512

ABSTRACT:
The method for coating plural surfaces on multiple sides of a substrate, especially a lens, includes launching microwave outputs into a microwave reactor at respective microwave launch sites; selecting respective microwave outputs to be greater than or equal to thresholds at which corresponding plasmas having a reduced permeability to microwave radiation arise in the microwave reactor; setting distances between the plural surfaces and microwave launch sites greater than microwave penetrations depths in the plasmas; placing respective dielectric tuning elements in microwave fields formed from the microwave outputs at the launch sites; and adapting the shapes of the dielectric tuning elements to the plural surfaces to be coated, so that plasma inhomogeneities are corrected and coatings with a uniformity of ±1% are formed on the plural surfaces.

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