Method for manufacturing gallium nitride-based semiconductor...

Details Method for manufacturing gallium nitride-based semiconductor... Method for manufacturing gallium nitride-based semiconductor...

2005-05-17

2005-05-17

Pert, Evan (Department: 2829)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

C438S034000

Reexamination Certificate

active

06893889

ABSTRACT:
A method of manufacturing a gallium nitride-based semiconductor light emitting device, includes sequentially forming, over a substrate, a first conductivity type clad layer, an active layer, and a second conductivity type clad layer, forming a transparent electrode over the second conductivity type clad layer, forming a photoresist film on the transparent electrode such that the transparent electrode is exposed at a predetermined region, removing respective portions of the transparent electrode, second conductivity type clad layer, and active layer corresponding to the predetermined region, thereby partially exposing the first conductivity type clad layer, removing the photoresist film, and forming first and second bonding electrodes on predetermined portions of the transparent electrode and second conductivity type clad layer, respectively.

REFERENCES:
patent: 5563422 (1996-10-01), Nakamura et al.
patent: 20030077847 (2003-04-01), Yoo

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