Apparatus and methods for reducing damage to substrates...

Details Apparatus and methods for reducing damage to substrates... Apparatus and methods for reducing damage to substrates...

2005-05-17

2005-05-17

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S034000, C134S137000, C134S148000, C134S151000, C134S153000, C134S184000, C134S198000, C134S902000, C310S311000, C310S320000, C310S367000, C310S368000, C310S369000, C310S370000, C438S906000

Reexamination Certificate

active

06892738

ABSTRACT:
The present invention provides a megasonic cleaning apparatus configured to provide effective cleaning of a substrate without causing damage to the substrate. The apparatus includes a probe having one of a variety of cross-sections configured to decrease the ratio of normal-incident waves to shallow-angle waves. One such cross-section includes a channel running along a portion of the lower edge of the probe. Another cross-section includes a narrow lower edge of the probe. Another cross-section is elliptical. Another cross-section includes transverse bores originating in the lower edge of the probe. As an alternative to, or in addition to, providing a probe having a cross-section other than circular, the present invention may also provide a probe having a roughened lower surface.

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