Position detection device, apparatus using the same,...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S491100, C250S216000, C430S030000, C430S311000, C430S394000, C438S949000

Reexamination Certificate

active

06946666

ABSTRACT:
An exposure apparatus for irradiating exposure light onto a surface of an object to be exposed applied with a resist to form a pattern on the surface, wherein near-field light is used as the exposure light. The apparatus includes an alignment system for performing alignment using the near-field light, the alignment system detecting position information of the object to be exposed by irradiating light from an illumination device onto an alignment mark formed on the surface of the object to be exposed, and an alignment probe for detecting near-field light in the vicinity of the alignment mark.

REFERENCES:
patent: 3808550 (1974-04-01), Ashkin
patent: 4659429 (1987-04-01), Isaacson et al.
patent: 4670650 (1987-06-01), Matsuzawa et al.
patent: 4812661 (1989-03-01), Owen
patent: 4947034 (1990-08-01), Wickramasinghe et al.
patent: 5106455 (1992-04-01), Jacobsen et al.
patent: 5117110 (1992-05-01), Yasutake
patent: 5121256 (1992-06-01), Corle et al.
patent: 5270794 (1993-12-01), Tsuji et al.
patent: 5343460 (1994-08-01), Miyazaki et al.
patent: 5362585 (1994-11-01), Adams
patent: 5384464 (1995-01-01), De Fornel et al.
patent: 5415835 (1995-05-01), Brueck et al.
patent: 5445011 (1995-08-01), Ghislain et al.
patent: 5486919 (1996-01-01), Tsuji et al.
patent: 5618760 (1997-04-01), Soh et al.
patent: 6097473 (2000-08-01), Ota et al.
patent: 0 502 679 (1992-09-01), None
patent: 4-186716 (1992-07-01), None
patent: 4-267536 (1992-09-01), None
patent: 6-204118 (1994-07-01), None
patent: 7-270123 (1995-10-01), None
patent: 08045814 (1996-02-01), None
patent: 8-321454 (1996-12-01), None
(XP 000449375) H.L. Stover, et al.Optical Microlithography—Technology for the, SPIE vol. 334, pp 120-131 (1982).
(XP 000449376) W. Carpenter, et al.Optical Microlithography IV, Proc. SPIE vol. 538, (1985).
(XP 000514340) R. Jonckheere, et al.8226 Microelectronic Engineering27 (1995) Febr., Nos. 1/4 Amsterdam, NL, pp 231-234.
(XP 000519853) Shuzo Hattori, et al. Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX (1990) pp 110-115, /SPIE vol. 1263.

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