Heating apparatus having electrostatic adsorption function

Details Heating apparatus having electrostatic adsorption function Heating apparatus having electrostatic adsorption function

2005-09-27

2005-09-27

Evans, Robin O. (Department: 3742)

Electric heating

Heating devices

With heating unit structure

C219S444100, C219S544000

Reexamination Certificate

active

06949726

ABSTRACT:
A heating apparatus having an electrostatic adsorption function comprising at least a supporting substrate, an electrode for electrostatic adsorption and a heating layer formed on the supporting substrate, and an insulating layer formed so as to cover the electrode for electrostatic adsorption and the heating layer, wherein a surface roughness of the insulating layer satisfies Ra≦0.05 μm and Rmax≦0.6 μm, and Vickers hardness of the surface of the insulating layer is 10 GPa or less. Thus, there can be provided a heating apparatus having an electrostatic adsorption function in which scratches are not generated on a silicon wafer or the like and the generation of particles can be suppressed when heating/cooling the wafer or the like.

REFERENCES:
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Watanabe, “Electrostatic Characteristics of Ceramic Electrostatic Chuck,” New Ceramics, vol. 7, No. 2, pp. 49-53, 1994.

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