Method for manufacturing NAND type nonvolatile ferroelectric...

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

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C438S257000

Reexamination Certificate

active

06900064

ABSTRACT:
NAND type non-volatile ferroelectric memory cell and non-volatile ferroelectric memory of the same, in which numbers of access to a main cell and a reference cell are made the same, to maintain bitline induced voltages by the reference cell and by the main cell constant, for improving operation characteristics, minimizing a layout area, and permits a high density device integration, the memory cell including an N number of transistors connected in series, a bitline having an input terminal of a first transistor and an output terminal of (N)th transistor among the N number of transistors connected thereto, wordlines respectively connected to gates of the transistors except the (N)th transistor, a WEC signal line connected to a gate of the (N)th transistor and adapted to have an enable signal applied thereto only in a write or re-store mode, and ferroelectric capacitors respectively connected both to the wordlines and output terminals of the transistors.

REFERENCES:
patent: 4873664 (1989-10-01), Eaton, Jr.
patent: 5300799 (1994-04-01), Nakamura et al.
patent: 5345415 (1994-09-01), Nakao et al.
patent: 5585300 (1996-12-01), Summerfelt
patent: 5680344 (1997-10-01), Seyyedy
patent: 5708284 (1998-01-01), Onishi
patent: 5903492 (1999-05-01), Takashima

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