Pad support method for chemical mechanical planarization

Abrading – Abrading process – Glass or stone abrading

Reexamination Certificate

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C451S059000, C451S063000

Reexamination Certificate

active

06887133

ABSTRACT:
Embodiments of the invention as directed to supporting a polishing pad that can be easily replaced. In one embodiment, a method for polishing an object comprises coupling a polishing head to a substrate for holding a polishing pad which is smaller in area than the object; applying a resilient mechanical force to the perimeter of the substrate with the polishing head to hold the substrate in place during a polishing operation; placing the polishing pad in contact with the object; and rotating the polishing pad with the polishing head.

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