Positive photoresist transfer material and method for...

Details Positive photoresist transfer material and method for... Positive photoresist transfer material and method for...

2005-04-19

2005-04-19

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S258000, C430S262000, C430S263000

Reexamination Certificate

active

06881529

ABSTRACT:
A positive photoresist transfer material, wherein an alkali-soluble thermoplastic resin layer, an intermediate layer and a positive photoresist layer are successively applied on an adhesive surface of a temporary support, and adhesion between the positive photoresist layer and the intermediate layer is less than adhesion between other layers or surfaces.

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patent: 2873889 (1999-01-01), None
patent: 2000-105466 (2000-04-01), None

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