Semiconductor device manufacturing: process – Having magnetic or ferroelectric component
Reexamination Certificate
2005-09-27
2005-09-27
Ghyka, Alexander (Department: 2812)
Semiconductor device manufacturing: process
Having magnetic or ferroelectric component
C438S455000, C438S458000
Reexamination Certificate
active
06949386
ABSTRACT:
The present invention relates to a method for producing in large numbers a multiplicity of magnetic sensors produced on a semiconductor substrate, these sensors comprising at least one magnetic core produced in an amorphous magnetic material, characterised in that, after integration of the electronic circuits associated with the magnetic sensors, a film of amorphous magnetic material is glued onto the semiconductor substrate, this film being obtained from a band of amorphous magnetic material cut into a plurality of sections which are disposed one beside the other on a support, said film being then structured in order to form the magnetic cores of said magnetic sensors, the semiconductor substrate being finally cut up in order to provide a plurality of individual magnetic sensors.
REFERENCES:
patent: 6437558 (2002-08-01), Li et al.
patent: 6809516 (2004-10-01), Li et al.
patent: 2001/0040450 (2001-11-01), Li et al.
patent: 2002/0039263 (2002-04-01), Inaguma
patent: 2002/0090755 (2002-07-01), Matsuzaki et al.
patent: 2004/0004261 (2004-01-01), Takahashi et al.
patent: 2004/0131887 (2004-07-01), Ao et al.
patent: 2005/0042478 (2005-02-01), Okuno et al.
patent: 1 052 519 (2000-11-01), None
patent: 9-214017 (1997-08-01), None
Chiesi, Laurent, “Planar 2D Fluxgate Magnetometer for CMOS Electronic Compass,” Series in Microsystems, vol. 4, Hartung-Gorre Vertag. pp. 48-51.
Blanchard, Hubert, “Hall Sensors with Integrated Magnetic Flux Concentrators,” Series in Microsystems, vol. 5, Hartung-Gorre Verlag, pp. 74-77.
L. Chiesi et al., “CMOS planar 2D micro-fluxgate sensor,” EPFL, Swiss Federal Institute of Technology, Institute of Microsystems, Lausanne, Switzerland, Nov., 1999.
H. Blanchard et al., “Cylindrical Hall Device,” EPFL Swiss Federal Institute of Technology, Institute of Microsystems, Lausanne, Switzerland & Sentron AG, Zug, Switzerland.
M. Schneider et al., “High Sensitivity CMOS MicroFluxgate Sensor,” Phys. Elec. Lab., Zurich, Switzerland & Dept. of Info. & Comp. Sciences, Toyohashi Univ., Toyohashi, Japan.
H. Blanchard, “Hall Sensors with Integrated Magnetic Flux Concentrators,” Hartung-Gorre Verlag Konstanz, 1999.
Search Report for PCT/EP02/05753 in French, dated Apr. 8, 2003.
Piguet Dominique
Vincent Franck
Asulab S.A.
Ghyka Alexander
Griffin & Szipl, P.C.
LandOfFree
Method for mass production of a plurality of magnetic sensors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for mass production of a plurality of magnetic sensors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for mass production of a plurality of magnetic sensors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3371580