Electron beam exposure system and an apparatus for carrying out

Details Electron beam exposure system and an apparatus for carrying out Electron beam exposure system and an apparatus for carrying out

1978-12-21

1981-09-22

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250442, H01J 3700

Patent

active

042912318

ABSTRACT:
Electron beam exposure system provides a basic pattern data memory for storing data corresponding to the dimensions and the positions of patterns of a basic unit pattern which frequently appears as a unit in a pattern to be exposed on a wafer, and a central processing unit provided with an additional memory system which stores data corresponding to the position at which the basic unit pattern is to be exposed. This system determines the position of the basic unit pattern by adding data from the basic pattern data memory and data from the additional memory system through the central processing unit in accordance with a command of the central processing unit. Thereafter, data corresponding to the dimensions of the patterns in the basic unit patterns from the basic pattern data memory are sent as an input to a deflection system. As a result, the system according to the present invention applies electron beam deflection signals, which are produced by using the obtained data corresponding to the positions and the dimensions of the basic unit patterns, to the deflecting means of the electron beam exposure apparatus.

REFERENCES:
patent: 3900737 (1975-08-01), Collier et al.
patent: 4051381 (1977-09-01), Trotel
patent: 4132898 (1979-01-01), Buelow et al.
patent: 4147937 (1979-04-01), Buelow et al.
patent: 4151422 (1979-04-01), Goto et al.
"A Computer-Controlled Electron-Beam Machine for Microcircuit Fabrication", Chang et al., IEEE Transactions on Electron Devices, vol. 19, No. 5, May 1972, pp. 629-635.
"Scanning Electron Beam Lithography for Fabrication of Magnetic Bubble Circuits", Chang et al., IBM Jour. Research and Development, vol. 20, No. 4, Jul. 1976, pp. 376-388.
"Spot Shaping for Electron-Beam Lithography", Pfeiffer, J. Vac. Sci. Technol., 15, May, Jun. 1978, pp. 887-890.

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