Holder, system, and process for improving overlay in...

Details Holder, system, and process for improving overlay in... Holder, system, and process for improving overlay in...

2005-01-25

2005-01-25

Lee, John R. (Department: 2881)

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

C355S067000, C355S069000, C355S077000, C430S022000, C430S030000, C430S967000, C250S491100, C250S492100, C250S492200, C250S492220, C250S519100

Reexamination Certificate

active

06847433

ABSTRACT:
A deformable holder, system, and process where long range errors (any of lithography, metrology, or overlay errors) between the image of a mask and an existing pattern on a wafer from a number of potential sources are corrected. The long range errors are determined using either a through-the-lens alignment metrology system or an around-the-lens metrology system. Deformation values are determined to compensate for the longe range errors. The deformation values are determined by either solving simultaneous equations or by finite-element linear-stress-analysis (FEA). The mask or wafer is then distorted, in-plane, by an amount related to the determined deformation values using an actuator such an a piezoelectric ceramic to push or pull the mask or wafer to substantially realign the projected image of the mask and the existing pattern on the wafer.

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patent: 20020105628 (2002-08-01), Saito et al.

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