Method for manufacturing electron source and method for...

Electric lamp or space discharge component or device manufacturi – Process – With start up – flashing or aging

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C445S024000

Reexamination Certificate

active

06835110

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a method for manufacturing an electron source comprising a large number of electron-emitting devices arranged and a method for manufacturing a display apparatus including the electron source.
2. Related Background Art
The electron-emitting devices include a field emission electron-emitting device, a metal/insulator/metal electron-emitting device and a surface conduction electron-emitting device. An arrangement, manufacturing method and the like of the surface conduction electron-emitting device are disclosed in Japanese Patent Application Laid-Open No. 7-235255 and Japanese Patent No. 2903295, for example.
Now, the surface conduction electron-emitting device disclosed in the specifications will be outlined in brief.
As schematically shown in
FIG. 14
, the surface conduction electron-emitting device comprises a substrate
1
, a pair of device electrodes
2
,
3
facing each other on the substrate
1
, and an electroconductive film
144
including an electron-emitting region
145
and connected to the device electrodes.
The electron-emitting region
145
is formed in the following manner. First, the electroconductive film
144
is placed to interconnect the electrodes
2
and
3
, and then, a process step referred to as a “forming” is carried out. In this step, a voltage is applied across the electrodes
2
and
3
in a high vacuum to pass a current through the electroconductive film
144
, thereby forming a gap in the part of electroconductive film
144
. Then, a process step referred to as an “activation” is carried out. In this step, a deposit
146
mainly composed of carbon and/or carbon compound is provided in the gap formed by the “forming” and on the electroconductive film in the vicinity of the gap.
In this way, carrying out the “forming” and the “activation” provides the electron-emitting region
145
. Here, the deposit
146
comprises two parts facing each other with a gap in-between, the gap being narrower than the gap formed in the electroconductive film
144
. In the activation step, a pulsed voltage is applied to the device in an atmosphere containing an organic material. Then, as the deposit
146
mainly composed of carbon and/or carbon compound accumulates, a current passing through the device (device current If) and a current emitted to the vacuum (emission current Ie) are substantially increased, whereby better electron-emitting property can be provided.
Besides, in Japanese Patent Application Laid-Open No. 9-237571, there is disclosed a method for manufacturing an electron-emitting device, the method including, instead of the “activation” step, a step of applying an organic material, such as a thermosetting resin, an electron beam polymerization type negative resist and polyacrylonitrile, on the electroconductive film and a step of carbonizing the same.
Then, combining the electron source comprising a plurality of such electron-emitting devices with a light-emitting member such as a phosphor or the like can provide an image-forming apparatus, such as a flat panel display.
SUMMARY OF THE INVENTION
As for the electron source comprising a plurality of electron-emitting devices and the image display apparatus, it has been demanded that the manufacturing methods therefor are simple, and an image can be displayed on a large screen for a long time with high definition, brightness and uniformity.
Thus, for the electron source or image display apparatus involving the surface conduction electron-emitting devices, it is desired to provide a further simplified manufacturing process as well as a further enhanced uniformity in electron-emitting property between the devices.
Therefore, an object of this invention is to provide simple methods for manufacturing an electron source with excellent and highly uniform electron-emitting property and an image display apparatus including the electron source.
To attain the object, this invention has been devised as follows.
Specifically, according to this invention, there is provided a method for manufacturing an electron source, comprising:
(A) a step of disposing a plurality of units and a plurality of wirings connected to the plurality of units on a substrate, each unit comprising a polymer film (an organic polymer film) and a pair of electrodes with the polymer film interposed therebetween; and
(B) a step of forming electron-emitting devices from the plurality of units by sequentially repeating a process including a selecting substep of selecting a desired number of units from the plurality of units, a resistance-reducing substep of reducing resistance of the polymer films of the selected units and a gap-forming substep of forming a gap in each of the films obtained by the resistance-reducing substep.
Preferably, in the method for manufacturing an electron source according to this invention, the number of the units selected at one time is two or more.
Preferably, the gap is formed by passing a current through the film obtained by the resistance-reducing substep.
Preferably, the plurality of wirings comprises a plurality of row-directional wirings and a plurality of column-directional wirings crossing the row-directional wirings with an insulating layer interposed therebetween, and each of the plurality of units is connected to one of the plurality of row-directional wirings and one of the plurality of column-directional wirings.
Preferably, the selected units are a plurality of units connected to a same row-directional wiring or same column-directional wiring.
Preferably, the resistance of the polymer film is reduced by irradiating the polymer film with an energy beam.
Preferably, the energy beam is emitted from a plurality of energy beam irradiation source.
Preferably, the energy beam is an electron beam.
Preferably, the energy beam is a light beam.
Preferably, the energy beam is a laser beam.
Preferably, the energy beam is an ion beam.
Furthermore, according to this invention, there is provided a method for manufacturing a display apparatus having an electron source comprising a plurality of electron-emitting devices and a light emitting member that emits light in response to being irradiated with an electron emitted from the electron source, in which the electron source is manufactured by the method for manufacturing an electron source according to this invention described above.
According to this invention, a large number of polymer films (organic polymer films) can be reduced in resistance (conductivity can be imparted thereto), and a gap can be formed in each of a large number of the films obtained by reducing resistance of the large number of polymer films. That is, a large number of polymer films (organic polymer films) are formed, some (typically one) polymer film(s) selected among therefrom is/are transformed (reduced in resistance) to impart a sufficient conductivity thereto, and a current is applied to the transformed film(s) to form a gap in each film. Then, other (another) polymer film(s) is/are transformed to impart a sufficient conductivity thereto, and a current is applied to the transformed film(s) to form a gap in each film. Such a process is sequentially repeated. Thus, the gaps can be formed on all the transformed films eventually.
One effective method for reducing the resistance of some or one polymer film(s) is to transform the polymer film(s) by irradiating the polymer film(s) with an electron beam, light beam or ion beam. Using the electron beam, light beam or ion beam enables the resistance of only the selected polymer film(s) to be reduced in a relatively short time, and therefore, the power required for the “forming” can be distributed in terms of time. Thus, enhancement in screen size and production scale can be readily realized, and the electron-emitting devices with uniform property can be arranged over the whole display region.
With the manufacturing method according to this invention, an electron source with high efficiency capable of maintaining a highly uniform electron-emitting property for a long time can be

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for manufacturing electron source and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for manufacturing electron source and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for manufacturing electron source and method for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3290577

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.