Method for improving low temperature current gain of bipolar tra

Fishing – trapping – and vermin destroying

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437 27, 437150, 748DIG10, 748DIG2, H01L 21328, H01L 21265

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051852764

ABSTRACT:
A method for improving the low temperature current gain of silicon bipolar transistors by implanting a first and a second impurity of the same conductivity type into the base region to provide a high doping level base that increases bandgap narrowing without decreasing freeze-out activation energy. The second impurity is selected to have a higher ionization energy that that of the first impurity. The second impurity thereby freezes out sooner than the first impurity resulting in the freeze-out activation energy being equal to or greater than the energy with only the first impurity.

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