Spindle sleeve for coater/developer

Details Spindle sleeve for coater/developer Spindle sleeve for coater/developer

2000-12-21

2004-04-20

Crispino, Richard (Department: 1734)

Coating apparatus

With means to centrifuge work

C118S056000, C118S500000, C118S506000

Reexamination Certificate

active

06723167

ABSTRACT:

FIELD OF THE INVENTION
The present invention relates generally to the field of semiconductor, and specifically, semiconductor processing equipment.
BACKGROUND OF THE INVENTION
With an increased use of highly odiferous chemicals in the semiconductor processing environment (e.g., microlithography), odors emitted from these chemicals become more and more noticeable because some of the equipment used are not fully enclosed. For example, one of the equipment used in the lithography process is the Silicon Valley Group (SVG) 90xx series coater/developer. The 90xx series coater/developer has a gap between the spindle and the coater catch cup base plate. During the processing, the odiferous chemical emits odor via the gap and causes undesirable environment effects to personnel on the factory floor.
Therefore, there is a need to reduce the odiferous chemical odor from semiconductor processing equipment.


REFERENCES:
patent: 4227347 (1980-10-01), Tam
patent: 4696209 (1987-09-01), Felten et al.
patent: 5562947 (1996-10-01), White et al.
patent: 5695817 (1997-12-01), Tateyama et al.
patent: 6213478 (2001-04-01), Nishikawa

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