X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1994-07-01
1996-01-16
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 85, 378145, G21K 106
Patent
active
054854989
ABSTRACT:
An x-ray interface (40) provides increased x-ray collection efficiency for use in x-ray photolithography. The interface (40) comprises a housing (44) having a plurality of mirrored funnels (46) for collecting the x-rays. The mirrored funnels (46) are shaped to partially collimate and focus the x-rays. The interface (40) collects a greater percentage of the available x-rays from an x-ray source, and the interface (40) also permits a greater number of beamlines to be coupled to the x-ray source.
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patent: 5142561 (1992-08-01), Doumas
patent: 5175755 (1992-12-01), Kumakhov
patent: 5192869 (1993-03-01), Kumakhov
patent: 5204886 (1993-04-01), Dugdale
patent: 5268951 (1993-12-01), Flamholz et al.
patent: 5272714 (1993-12-01), Chen et al.
Brodsky Eric
Cerrina Franco
Waldo, III Whitson G.
Bernstein Aaron B.
Motorola Inc.
Porta David P.
Wong Don
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