High resolution electron beam exposure machines

Details High resolution electron beam exposure machines High resolution electron beam exposure machines

1998-01-02

2003-10-21

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

Reexamination Certificate

active

06635888

ABSTRACT:

FIELD OF THE INVENTION
This invention relates to high resolution electron beam exposure machines such as the type used for submicron lithography, and particularly to space charge neutralization of electrons therein.
BACKGROUND OF THE INVENTION
Electron beam exposure machines for submicron lithography, such as for writing on optical or x-ray mask surfaces, or directly on semiconductor surfaces, pass electrons through apertures of a mask. Such devices are limited by the space charges of electrons which repel one another.
SUMMARY OF THE INVENTION
An embodiment of the invention involves bleeding gas into the vicinity of the apertures in the mask and pumping the gas out from the direction electron travel.


REFERENCES:
patent: 5693950 (1997-12-01), Stengl et al.
patent: 2002/0079464 (2002-06-01), Dreissen et al.
patent: 2000011933 (2000-01-01), None

Affiliated with

Also associated with

Rating

High resolution electron beam exposure machines does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High resolution electron beam exposure machines, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High resolution electron beam exposure machines will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3149802