Semiconductor device including internal potential generating...

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Reexamination Certificate

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C365S189090, C365S189070, C365S189110

Reexamination Certificate

active

06515934

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a semiconductor device and, more specifically, to a semiconductor device mounting an internal power supply generating circuit.
2. Description of the Background Art
Recently, as the semiconductor devices have been developed to operate at ever lower voltages, driving of a transistor in a semiconductor device with a power supply voltage lower than the power supply voltage applied from outside of the semiconductor device has been strongly desired. The requirement of reduced power consumption of the semiconductor device and of higher reliability of the transistor are underlying factors of such trend.
In a dynamic random access memory (DRAM), it is also an important problem to ensure reliability of a dielectric film of a capacitor holding charges in a memory cell.
Upper limit of an internal power supply voltage of a semiconductor device has been made lower generation by generation due to the requirements described above, resulting in ever larger difference from the power supply voltage used in the system. Thus, a voltage down converter is provided, which is a circuit for down converting the power supply voltage used in the system to generate a stable internal power supply voltage. The voltage down converter closes a gap between the power supply voltage used in the system and the internal power supply voltage used in the semiconductor device, so as to ensure the reliability inside the semiconductor device.
FIG. 15
is a circuit diagram representing a configuration of a typical conventional voltage down converter.
Referring to
FIG. 15
, the voltage down converter includes a reference potential generating circuit
300
for generating a reference potential as a reference for an internal power supply potential generated in a chip, and a voltage converting unit
302
receiving a reference potential Vref generated by reference potential generating circuit
300
and generating an internal power supply potential int.Vcc.
Voltage converting unit
302
includes a differential amplifier circuit
304
comparing levels of reference potential Vref and internal power supply potential int.Vcc, and a P channel MOS transistor
306
receiving an output of differential amplifier circuit
304
at its gate, and connected between an external power supply node receiving an external power supply potential Ext.Vcc and an internal power supply node outputting the internal power supply potential int.Vcc.
Differential amplifier circuit
304
has a negative input node connected to the reference potential Vref and a positive input node receiving the internal power supply potential int.Vcc. Differential amplifier circuit
304
controls switching of P channel MOS transistor
306
to stabilize the internal power supply potential int.Vcc to the same level as the reference potential Vref.
FIG. 16
is a circuit diagram representing a configuration of reference potential generating circuit
300
of FIG.
15
.
Referring to
FIG. 16
, reference potential generating circuit
300
includes a constant current source
312
and a resistance circuit
313
connected in series between a power supply node to which the external power supply potential Ext.Vcc is applied and the ground node. A connection node between constant current source
312
and resistance circuit
313
is an output node of reference potential generating circuit
300
, from which reference potential Vref is output.
Reference potential generating circuit
300
further includes a capacitor
324
for stabilizing potential, connected between the output node outputting the reference potential Vref and the ground node.
Resistance circuit
313
includes P channel MOS transistors
314
to
322
connected in series between the output node outputting the reference potential Vref and the ground node. P channel MOS transistors
314
to
322
receive at their gates the ground potential.
Resistance circuit
313
further includes a switch circuit
326
connected in parallel with P channel MOS transistor
314
, a switch circuit
328
connected in parallel with P channel MOS transistor
316
, a switch circuit
330
connected in parallel with P channel MOS transistor
318
, and a switch circuit
332
connected in parallel with P channel MOS transistor
320
.
As a constant current applied from constant current source
212
flows against the channel resistances of P channel MOS transistors
314
to
322
, reference potential Vref is determined. In order to prevent fluctuation of reference potential Vref due to the variation of channel resistances of P channel MOS transistors, switch circuits
316
to
332
include fuse elements. The configuration allows adjustment of reference potential Vref by changing the state of conduction of each fuse element. By switching the switch circuits between the conduction and non-conduction states in accordance with the setting of the fuses, tuning to 2
4
different values, that is, 16 values is possible.
Determination of fuse setting will be described in the following.
FIG. 17
is a circuit diagram showing detailed configuration of switch circuit
326
.
Referring to
FIG. 17
, switch circuit
326
includes a pad
390
receiving a tuning signal TSIGn, an inverter
392
receiving and inverting the tuning signal TSIGn, an N channel MOS transistor
396
connected in series between nodes NAn and NBn, a fuse element
398
, and a P channel MOS transistor
394
connected in parallel with N channel MOS transistor
396
and receiving tuning signal TSIGn.
An output of inverter
392
is applied to the gate of N channel MOS transistor
396
. Node NAn is connected to the source of P channel MOS transistor
314
of
FIG. 15
, and node NBn is connected to the drain of P channel MOS transistor
314
.
In a default state where the fuse is not blown off and the tuning signal TSIGn is at an L (low) level, nodes NAn and NBn of switch circuits
326
are conducted. When the tuning signal TSIGn is set to an H (high) level, conduction is lost between nodes NAn and NBn, and thus a state is established which is equivalent to the state where fuse element
398
is blown off.
Switch circuits
328
and
330
shown in
FIG. 16
have similar structures as switch circuit
326
, and therefore, description thereof is not repeated.
FIG. 18
is a circuit diagram representing a configuration of switch circuit
332
shown in FIG.
16
.
Referring to
FIG. 18
, switch circuit
332
includes a P channel MOS transistor
402
having its gate connected to the ground node and its source coupled to the external power supply potential Ext.Vcc, an N channel MOS transistor
406
having its gate connected to the ground node and connected between node N
31
and the ground node, a fuse element
404
connected between the drain of P channel MOS transistor
402
and node N
31
, N channel MOS transistors
420
and
422
connected in parallel between node N
31
and the ground node, and an inverter
410
having an input node connected to node N
31
.
A signal BIAS of which level is constant is applied to the gate of N channel MOS transistor
420
, and an output of inverter
410
is applied to the gate of N channel MOS transistor
422
.
Switch circuit
332
further includes a pad
408
receiving the tuning signal TSIGn, an OR circuit
412
receiving the tuning signal TSIGn and an output of inverter
410
, an inverter
414
receiving and inverting an output of OR circuit
412
, and a P channel MOS transistor
418
and an N channel MOS transistor
416
connected in parallel between nodes NAn and NBn.
An output of OR circuit
412
is applied to the gate of N channel MOS transistor
416
, and an output of inverter
414
is applied to the gate of P channel MOS transistor
418
.
In the default state where tuning signal TSIGn is at the L level and fuse element
404
is not blown off, conduction is not established between nodes NAn and NBn in switch circuit
332
. Node NAn of switch circuit
332
is connected to the source of P channel MOS transistor
320
of
FIG. 15
, and node NBn is connected to the drain of P channel MOS transi

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