Emissivity correction apparatus and method

Thermal measuring and testing – Emissivity determination

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

374126, 374128, 374133, 356 43, 350438, 350439, 2503383, 250339, G01J 510, G01N 2500

Patent

active

049195425

ABSTRACT:
Radiation detectors and method measure the emissivity of a remote, heated semiconductor wafer in the presence of ambient radiation. Incident radiation within a selected waveband from a controlled source intermittently radiates the remote wafer, and reflected radiation therefrom is detected in synchronism with the intermittent incident radiation to yield output indications of emissivity of the wafer under varying processing conditions. The temperature of the wafer is monitored by another radiation detector (or detectors) operating substantially within the same selected waveband, and the temperature indications thus derived are corrected in response to the output indications of emissivity to provide indications of the true temperature of the wafer.

REFERENCES:
patent: 3433052 (1969-03-01), Maley
patent: 3439985 (1969-04-01), Comstock, Jr. et al.
patent: 3539807 (1970-11-01), Bickel
patent: 3611806 (1971-10-01), Hishikari
patent: 3796099 (1974-03-01), Shimotsuma et al.
patent: 4564761 (1986-01-01), Buckwald et al.
patent: 4647774 (1987-03-01), Brisk et al.
patent: 4708493 (1987-11-01), Stein
Gardner, J. L. and Jones, T. P., "Multi-Wavelength Radiation Pyrometry Where Reflectance is Measured to Estimate Emissivity", J. Phys. E. Sci. Instrum., vol. 13, No. 3, pp. 306-310, Mar. 1980.
Johansson, Rutger, "A New Real-Time Infrared Imaging and Measuring System for Burden Top Temperature Monitoring on Blast Furnaces", ISA Transactions, vol. 17, No. 4, pp. 47-53, (1978).
"Industrial Use of Radiation Pyrometers under Non-Blackbody Conditions", Harrison, Thomas R., Journal of the Optical Society of America, vol. 35, No. 11, pp. 708-723, Nov. 1945.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Emissivity correction apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Emissivity correction apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Emissivity correction apparatus and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-31235

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.