Process for producing bismuth-based oxide superconducting films

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k

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505730, 505731, 505732, 505742, 427 62, 4271263, B05D 512

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052760103

ABSTRACT:
A process for producing an oxide crystalline thin film having a structure in which atomic layers having different chemical compositions are laminated along the film thickness direction, the process including the steps of depositing amorphous atomic layers on a substrate, layer by layer and heating the amorphous deposit to crystallize the deposit, the respective amorphous atomic layers having the same chemical compositions as those of the corresponding atomic layers of the oxide crystal structure and being stacked in an order corresponding to the atomic lamination of the crystal structure.

REFERENCES:
Paserin et al, "Vacuum deposition of multilayer Bi-Ca-Sr-Cu-O superconducting thin films", Appl. Phys. lett. 53(7) Aug. 1988 pp. 624-625.
Kuroda et al, "Preparation of New High-T.sub.c Superconducting Oxide Bi-Sr-Ca-Cu-O Thin Film by Electron Beam Deposition Technique", Jpn. J. Appl. Phys. 27(4) Apr. 1988 L625-627.
Qui et al, "Y-Ba-Cu-O thin films prepared by a multilayer vacuum method", Appl. Phys. Lett. 52(7) Feb. 1988 pp. 587-589.
Azoulay et al, "Preparation of very thin superconducting films of Y-Ba-Cu-O by a layer-by-layer resistive evaporation", J. Appl. Phys. 66(8) Oct. 1989 pp. 3937-3939.
Tsaur et al, "Preparation of superconducting YBa.sub.2 Cu.sub.3 O.sub.x thin films by oxygen annealing of multilayer metal films", Appl. Phys. lett. 51(11) Sep. 1987 pp. 858-860.
Bao et al, "YBaCuO superconducting thin films with zero resistance at 84k by multilayer deposition". Appl. Phys. lett.51(12) Sep. 1987, pp. 946-947.
"Epitaxial Growth of High-Temperature Superconducting Thin Films", Eckstein et al, Journal of Vacuum Science Technology, B7 (2), Mar./Apr., 1989, pp. 319-323.

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