Photosensitive compositions and lithographic printing plates con

Details Photosensitive compositions and lithographic printing plates con Photosensitive compositions and lithographic printing plates con

1992-07-23

1994-01-04

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430175, 430176, 430278, 430302, 430908, 430909, G03F 7021, G03F 709

Patent

active

052759075

ABSTRACT:
Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin, an acid-substituted ternary acetal polymer, and a copolyester of an unsaturated dicarboxylic acid and an oxyalkylene ether of an alkylidene diphenol. The acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid-substituted alkyl group or an acid-substituted aryl group.

REFERENCES:
patent: 4652604 (1987-03-01), Walls et al.
patent: 4741985 (1988-05-01), Aoai et al.
patent: 4940646 (1990-07-01), Pawlowski
patent: 5045432 (1991-09-01), West et al.
patent: 5053315 (1991-10-01), West et al.
patent: 5061600 (1991-10-01), West et al.
patent: 5219699 (1993-06-01), Walls et al.

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